We actively develop strategic emerging industries, actively research and develop high-end impurity free lapping powders, lapping and polishing for lapping and polishing of interactive surfaces, lapping and polishing for high gloss finish and continuously promote the optimization and upgrading of product structure.With our advanced equipment and exquisite workmanship, we focus on the development and production of modern lapping powders through continuous practice and innovation. Our company is committed to creating a culture of integrity and accountability. We promise to abide by all laws and regulations, and be responsible for our words and deeds, fulfill our duties and strive for performance and achievements. The ability of independent innovation is the key to the success of our company's industrial development. Our company has a strong focus on innovation and continuous improvement. The rapid development of our company demonstrates our passion, wisdom, diligence, ability and pursuit, as well as the development concept of advancing with the times, pursuing excellence and the tenacious spirit of unity and hard work.
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![Diamond Suspensions]()
Diamond SuspensionsHigh hardness: Diamond has an extremely high hardness, with a Mohs hardness of up to 10, which can effectively grind and cut various materials and perform well in grinding and polishing processes.read more -
![Silicon Carbide Powders]()
Silicon Carbide PowdersHigh hardness：The Mohs hardness is 9.2 - 9.5, second only to diamond. This makes it perform well in applications such as grinding and cutting, and it can effectively grind and process hard materials.read more -
![Aluminium Oxide Powders]()
Aluminium Oxide PowdersAppearance: It is usually a white or off white amorphous powder, and its particle size and shape may vary depending on different preparation methods and process conditionsread more -
![Cerium Oxide Powders]()
Cerium Oxide PowdersAppearance: It is usually a white or slightly yellow powder, and as the purity increases, the color becomes closer to white.read more
Density: The density is relatively high, about 7.13 g/cm ³,... -
![Boron Carbide Powders]()
Boron Carbide PowdersHigh hardness: Boron carbide has a hardness second only to diamond and cubic boron nitride, with a Mohs hardness of 9.3. This makes it excellent in grinding, cutting, and other fields, and can...read more -
![Quartz Wax]()
Quartz WaxSemiconductor quartz wax is carefully developed for key processes in semiconductor manufacturing, and is a functional material with excellent performance. It is synthesized with a unique formula...read more -
![Unlapped Glass Substrate]()
Unlapped Glass SubstrateThe roughness range is set between Ra 0.5-1.5 μ m, which is conducive to the adhesion and uniform distribution of abrasive particles, ensuring the efficiency of the grinding process, and avoiding...read more -
![Corrosion-resistant Glass Substrate]()
Corrosion-resistant Glass SubstrateUsing a special formula of glass material, it undergoes high-temperature melting and special chemical treatment processes, making it highly resistant to common acid-base and other chemical...read more -
![Chemcloth Polishing Cloth]()
Chemcloth Polishing ClothPure chemical polishing pads are made of special chemical synthetic materials, and the surface contains abundant active chemical groups. These functional groups can undergo specific chemical...read more -
![Ethane-Diol Polishing Fluid]()
Ethane-Diol Polishing FluidEthylene glycol, as the main component, has good solubility and chemical stability, which can provide a stable liquid-phase environment for other additives, ensuring uniform dispersion of each...read more -
![Colloidal Silica Polishing Fluid]()
Colloidal Silica Polishing FluidSilicon dioxide polishing solution is a key polishing medium in the field of precision manufacturing, with nanoscale silicon dioxide particles as the main abrasive and various additives. It is...read more -
![Chemical Polishing Fluid]()
Chemical Polishing FluidThe working principle of semiconductor polishing and polishing chemical polishing solution is chemical mechanical synergy. During the polishing process, the abrasive particles in the polishing...read more
Blanche Foster
I think this practical product is worth buying!
Colette Holland
Every transaction with this company has been so successful and happy, I hope we have more transactions in the future!
Ginger Rogers
I really like these products, thank you!
Paige Askew
If you want to slow down this kind of product, you must come to see this product. After my multiple comparisons, I recommend the products of this store. This product is outstanding in terms of shape,
Colleen Rohrer
At the time of contacting this company, we were running out of time. In the absence of time, they still met our needs with efficient communication and advanced production equipment.
William Blanchard
I like this shop very much. I have shopped here many times. Their product quality is very good, and their service attitude is also very good.
Our firm aims to operating faithfully, serving to all of our consumers, and working in new technology and new machine continually for ul compliant glass substrates, lapping and polishing for lapping and polishing of smart surfaces . We're well-known as one of the leading modern lapping powders manufacturers in China. If you're going to buy discount modern lapping powders, welcome to get pricelist from our factory. Also, customized service is available.